Effect of Nitrogen Atoms on Carrier Concentration in Nitrogen-Implanted Silicon Substrates

  • Lin, Jeng-Ping (PI)
  • Lai, Chao-Sung (CoPI)

Project: National Science and Technology CouncilNational Science and Technology Council Academic Grants

Project Details

Project IDs

Project ID:PB8802-0329
External Project ID:NSC88-2215-E182-002
StatusFinished
Effective start/end date01/08/9831/07/99

Keywords

  • Nitrogen implation
  • Boron penetration
  • Deep submicron
  • Gate oxide
  • Electron direct tunneling

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