Investigation of the Carrier Formation Mechanism Affected by Ion Implantation Defects

Project: National Science and Technology CouncilNational Science and Technology Council Academic Grants

Project Details

Abstract

目前記憶體內運算已經成為延續摩爾定律重要的方向,需要發展三維積體電路。本計畫將釐清離子植入缺陷於低溫產生載子的機制,協助導入離子植入於低溫三維製程之開發,在學理及實務上皆有所貢獻。

Project IDs

Project ID:PB11107-7827
External Project ID:MOST111-2221-E182-059
StatusFinished
Effective start/end date01/08/2231/07/23