Project Details
Abstract
Due to excellent electrical conductivity, good visible light transparacy, and high infrared reflectivity,
transparent conducting oxide (TCO) thin films are the most important transparent conducting electrode
materials in optoelectronic devices. Currently, the primary TCO thin film materials used in the industry
is tin-doped indium oxides (ITO). However, due to some limitations and problems encountered in the
production processes and the applications of ITO thin films, there is an urgent need to find new
materials to replace ITO. Recently, aluminum-doped zinc oxides (AZO) thin films have been actively
studied due to their great potentials as alternative materials to replace ITO.
Due to the advantages of high produce rate, consistant high film quality, low deposition temperature,
and large area coating capability, sputtering is the main deposition method used in the industry to
produce TCO thin films. However, due to the problems of high deposition temperature for plastic
substrates and the requirement of lithography and etching to produce circuitry, how to resovle the
problems encountered in the sputtering deposition and processing of TCO thin films to meet the future
trend of soft plastic panels has become an important issue for both the industry and the academia. .
The objectives of this two year research project are to prepare AZO nano-powders, AZO conductive
coating solutions, and transparent conductive AZO thin films by combination of sol-gel method and
solvothermal method. In addition, the effects of the processing conditions on the characteristics of AZO
nano-powders, AZO conductive coating solutions, and AZO thin films will also be investigated.
Project IDs
Project ID:PB10007-7244
External Project ID:NSC100-2221-E182-054
External Project ID:NSC100-2221-E182-054
| Status | Finished |
|---|---|
| Effective start/end date | 01/08/11 → 31/07/12 |
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