The Process Development for Nitrided and Fluorinated Ultra-Thin Gate Oxides and Polysilicon Oxides

Lai, Chao-Sung (PI)
Chang, Ruey-Dar (CoPI)

Department of Electronic Engineering

Project: National Science and Technology Council › National Science and Technology Council Academic Grants

Project IDs

Project ID:PB8901-0265
External Project ID:NSC89-2215-E182-002

Status	Finished
Effective start/end date	01/08/99 → 31/07/00

Keywords

Ultra-thin gate oxide
Polysilicon oxide
Nitridation
Fluorination Boron penetration
MOSFET

Access Project

https://www.grb.gov.tw/search/planDetail?id=493822