三價鉻電沉積之水溶液組成及方法

Translated title of the contribution: A composition and a method of aqueous solution for Trivalent Chromium electrodeposition

Ching-An Huang (Inventor), YU-WEI LIU (Inventor), JUN-QING XU (Inventor)

Research output: Patent

Abstract

Disclosed is a composition and a method of aqueous solution for Trivalent Chromium electrodeposition that especially use the method of electrodeposition for coating Chromium on work pieces in an aqueous solution of low toxic Trivalent Chromium salt. Hypertoxic Chromium (VI) Ions can be replaced by low toxic Trivalent Chromium salt. Chromium metal is widely applied for the surface treatment of precision machine parts and sets due to its high hardness, oxidation resistance and wear resistance. Electrodeposition chromium divides into trimming chromium and hard chromium. Trimming chromium with thickness of 0.2-0.5 μm frequently electrodeposits with a copper or nickel layer which intensifies the brightness so as to be used trimming and protection. Hard chromium with thickness of 1 μm to a few mm can directly plate any kind of metal such as the surface of copper and aluminum and be used for the need of wear resistance, oxidation resistance and corrosion resistance.
Translated title of the contributionA composition and a method of aqueous solution for Trivalent Chromium electrodeposition
Original languageChinese (Traditional)
Patent numberI337629
IPCC25D 3/06(2006.01); C25D 5/00(2006.01)
StatePublished - 21 02 2011

Bibliographical note

公開公告號: I337629
Announcement ID: I337629

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