| Translated title of the contribution | Investigation of Normally-off p-GaN Gate HEMTs and Diodes Using Low Damage Etching Technique |
|---|---|
| Original language | Chinese (Traditional) |
| Supervisors/Advisors |
|
| State | Published - 2017 |
| Externally published | Yes |
以低破壞性蝕刻技術實現增強型P型閘極氮化鎵場效應電晶體及二極體之研究
- 李柏宏
Research output: Types of Thesis › Master's thesis