| Translated title of the contribution | Modeling and Control of Wafer Temperature and Thickness in a LPCVD Furnace |
|---|---|
| Original language | Chinese (Traditional) |
| Supervisors/Advisors |
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| State | Published - 2010 |
| Externally published | Yes |
低壓化學氣相沉積爐管內晶圓溫度及膜厚之建模和控制
黃禎祥
Research output: Types of Thesis › Master's thesis