Original language | Chinese (Traditional) |
---|---|
Pages (from-to) | 27-33 |
Journal | 真空科技 |
Volume | 26 |
Issue number | 1 |
State | Published - 2013 |
Keywords
- ALD
- Atomic layer deposition
- Hafnium oxide
- HfO
- Plasma
- Radio frequency sputter
- Sensing membrane
- Urea sensor
Chia-Ming Yang, 呂 增富, 呂 承恩, 王 義舜, Chao-Sung Lai
Research output: Contribution to journal › Journal Article › peer-review
Original language | Chinese (Traditional) |
---|---|
Pages (from-to) | 27-33 |
Journal | 真空科技 |
Volume | 26 |
Issue number | 1 |
State | Published - 2013 |