Skip to main navigation Skip to search Skip to main content

氮化鈦擴散阻擋層對應用於高密度DRAM之鈦酸鍶鋇電容器電性影響之探討

Translated title of the contribution: Study of the Effect of TiN Diffusion Barrier on the Electrical Properties of BST Capacitor used for High Density DRAM
  • 黃慶玲

Research output: Types of Thesis › Master's thesis

Translated title of the contributionStudy of the Effect of TiN Diffusion Barrier on the Electrical Properties of BST Capacitor used for High Density DRAM
Original languageChinese (Traditional)
Supervisors/Advisors
  • Lu, Hsin-Chun, Supervisor
StatePublished - 2002
Externally publishedYes

Access to Document

Cite this