| Translated title of the contribution | Effects of fabrication conditions on the characteristics of sputter-deposited amorphous indium gallium zinc oxide thin film resistive random access memory devices |
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| Original language | Chinese (Traditional) |
| Supervisors/Advisors |
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| State | Published - 2022 |
| Externally published | Yes |
製備條件對於濺鍍非晶性氧化銦鎵鋅薄膜電阻式記憶體元件特性影響之探討
邱偉誌
Research output: Types of Thesis › Master's thesis