| Translated title of the contribution | Non-thermal annealing fabrication of HfO2 thin films with a high dielectric constant for low-operating-voltage thin-film transistors |
|---|---|
| Original language | Chinese (Traditional) |
| Supervisors/Advisors |
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| State | Published - 2022 |
| Externally published | Yes |
製備無熱退火的高介電常數二氧化鉿薄膜以降低薄膜電晶體之操作電壓
李俊諺
Research output: Types of Thesis › Master's thesis