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製備無熱退火的高介電常數二氧化鉿薄膜以降低薄膜電晶體之操作電壓

Translated title of the contribution: Non-thermal annealing fabrication of HfO2 thin films with a high dielectric constant for low-operating-voltage thin-film transistors
  • 李俊諺

Research output: Types of Thesis › Master's thesis

Translated title of the contributionNon-thermal annealing fabrication of HfO2 thin films with a high dielectric constant for low-operating-voltage thin-film transistors
Original languageChinese (Traditional)
Supervisors/Advisors
  • Liu, Kou-Chen, Supervisor
StatePublished - 2022
Externally publishedYes

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