Abstract
This invention discloses a method and structure to change the different energy level transition rates of electrons inside non-metallic materials through dual-interface surface plasma, which includes: preparing a substrate; forming a first metallic layer on the substrate; forming a non-metallic material layer on the metallic layer and forming a second metallic material layer on the non-metallic layer. The structure has metals on both sides of the non-metallic material layer, and through the coupling of interface surface plasma on the two sides, the characteristics of the surface plasma can be adjusted as needed so that the surface plasma can be used to change the transition rates of electrons due to stimulated absorption, stimulated emission or spontaneous radiation inside the non-metallic material.
Translated title of the contribution | A method and structure to change the different energy level transition rates of electrons inside non-metallic materials through dual-interface surface plasma |
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Original language | Chinese (Traditional) |
IPC | G02F-001/35(2006.01) |
State | Published - 01 01 2014 |
Bibliographical note
公開公告號: 2.01400962E8Announcement ID: 2.01400962E8