1.3-μm GaInAsN Vertical-cavity surface-emitting lasers by oxide-planarized and surface-relief processes for single-mode operation

Feng Ming Lee*, Chia Lung Tsai, Chih Wei Hu, Kun Fu Huang, Meng Chyi Wu, Sun Chien Ko

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

1 Scopus citations

Abstract

In this letter, we investigate and characterize the 1.3-μ single-mode vertical-cavity surface-emitting lasers (VCSELs) with two GaInAsN strained multiple quantum wells as the active region. Surface relief technique and a thick silicon oxide were used for the spatial mode filtering and the planarization processing, respectively. The VCSELs with a 5-μm-diameter surface-relief aperture and a 12-μm-diameter oxide-confined aperture at room temperature exhibit a threshold current of 3 mA, a slope efficiency of 0.14 mW/mA, a maximum operation temperature of 90 °C and a single-mode behavior. These VCSELs show a maximum light output power of 1 mW for the single fundamental mode with a transverse-mode suppression of more than 30 dB and also show a clear eye-opening feature operated at 2.488 Gb/s and 12.6 mA.

Original languageEnglish
Pages (from-to)120-122
Number of pages3
JournalIEEE Electron Device Letters
Volume28
Issue number2
DOIs
StatePublished - 02 2007

Keywords

  • GaInAsN
  • Planar-type vertical-cavity surface-emitting lasers (VCSELs)
  • SiO planarization process
  • Surface relief

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