A general procedure for process yield with multiple characteristics

Fu Kwun Wang*

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

16 Scopus citations

Abstract

In this paper, we present a general procedure for evaluating the process yield with multiple characteristics in semiconductor manufacturing processes. The proposed process yield indices can be applied for multivariate normal distribution data or multivariate non-normal distribution data. These indices provide an exact measure of the overall process yield. Also, we show how to calculate the approximate lower confidence bound for the true process yield by using the one-to-one correspondence between the proposed process yield index and the overall process yield. Three examples are used to demonstrate the performance of the proposed approach. The results show that our procedure for evaluating the process yield with multiple characteristics is an effective approach.

Original languageEnglish
Article number4
Pages (from-to)503-508
Number of pages6
JournalIEEE Transactions on Semiconductor Manufacturing
Volume23
Issue number4
DOIs
StatePublished - 11 2010
Externally publishedYes

Keywords

  • Lower confidence bound
  • multiple characteristics
  • process yield

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