A novel self-aligned double-channel polysilicon thin-film transistor

In this paper, a high-current self-aligned double-channel polycrystalline silicon thin-film transistor (SA-DCTFT) is proposed, demonstrated, and analyzed. This self-aligned device, which includes two channels, a nitride spacer, two offset-gated structures, and a raised source/drain (RSD) region, reveals better device performance. In addition, the top and bottom channels of the proposed device are self-aligned, and no extra mask is needed as compared with the conventional double-channel devices. Our experimental results show that the on-current of the SA-DCTFT is about twice higher than that of the conventional structure, and the leakage current and kink effect are considerably reduced simultaneously. Moreover, the device stability, such as threshold voltage shift and current degradation under a high gate bias, is enhanced by the proposed self-aligned double channels, nitride spacer, offset-gated structures, and RSD design. The lower drain electric field of the SA-DCTFT is also benefitted to the device scaling down for better performance.