Abstract
The conduction channel of a graphene field-effect transistor (FET) is decoupled from the parasitic charge impurities of the underlying substrate. Fluorographene as a passivation layer is fabricated between the oxide substrate and channel, and a self-aligned gate-terminated FET is also fabricated. This approach significantly reduces the scattering and, as a result, the mobility increases ten fold.
Original language | English |
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Pages (from-to) | 6519-6525 |
Number of pages | 7 |
Journal | Advanced Materials |
Volume | 27 |
Issue number | 41 |
DOIs | |
State | Published - 01 11 2015 |
Bibliographical note
Publisher Copyright:© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Keywords
- field-effect transistors
- fluorographene
- graphene
- scattering
- self-aligned