Abstract
The conduction channel of a graphene field-effect transistor (FET) is decoupled from the parasitic charge impurities of the underlying substrate. Fluorographene as a passivation layer is fabricated between the oxide substrate and channel, and a self-aligned gate-terminated FET is also fabricated. This approach significantly reduces the scattering and, as a result, the mobility increases ten fold.
| Original language | English |
|---|---|
| Pages (from-to) | 6519-6525 |
| Number of pages | 7 |
| Journal | Advanced Materials |
| Volume | 27 |
| Issue number | 41 |
| DOIs | |
| State | Published - 01 11 2015 |
Bibliographical note
Publisher Copyright:© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Keywords
- field-effect transistors
- fluorographene
- graphene
- scattering
- self-aligned