Abstract
We report the fabrication of AlGaN metal-semiconductor-metal (MSM) ultraviolet (UV) photodetectors with low temperature (LT)-AlGaN and LT-GaN cap layers. It was found that the dark currents were 8.3 × 10-9, 3.3 × 10-12, and 1.1 × 10-12A under 5 V applied bias while the effective Schottky barrier heights were 0.781, 0.992, and 0.998 eV for the AlGaN photodetectors without a cap layer, with a LT-GaN cap layer and with a LT-AlGaN cap layer, respectively. It was also found that the maximum responsivities were 0.0361. 0.0328. and 0.0315 A/W for the AlGaN photodetectors without the cap layer, with the LT-GaN cap layer and with the LT-AlGaN cap layer, respectively.
Original language | English |
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Pages (from-to) | 2471-2473 |
Number of pages | 3 |
Journal | Japanese Journal of Applied Physics |
Volume | 46 |
Issue number | 4 B |
DOIs | |
State | Published - 24 04 2007 |
Keywords
- AIGaN
- Low-temperature growth
- MSM photodetector