AlGaN ultraviolet metal-semiconductor-metal photodetectors with low-temperature-grown cap layers

Shoou Jinn Chang*, Hung Hung, Yi Chao Lin, Ming Hsien Wu, Hon Kuan, Ray Ming Lin

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

6 Scopus citations

Abstract

We report the fabrication of AlGaN metal-semiconductor-metal (MSM) ultraviolet (UV) photodetectors with low temperature (LT)-AlGaN and LT-GaN cap layers. It was found that the dark currents were 8.3 × 10-9, 3.3 × 10-12, and 1.1 × 10-12A under 5 V applied bias while the effective Schottky barrier heights were 0.781, 0.992, and 0.998 eV for the AlGaN photodetectors without a cap layer, with a LT-GaN cap layer and with a LT-AlGaN cap layer, respectively. It was also found that the maximum responsivities were 0.0361. 0.0328. and 0.0315 A/W for the AlGaN photodetectors without the cap layer, with the LT-GaN cap layer and with the LT-AlGaN cap layer, respectively.

Original languageEnglish
Pages (from-to)2471-2473
Number of pages3
JournalJapanese Journal of Applied Physics
Volume46
Issue number4 B
DOIs
StatePublished - 24 04 2007

Keywords

  • AIGaN
  • Low-temperature growth
  • MSM photodetector

Fingerprint

Dive into the research topics of 'AlGaN ultraviolet metal-semiconductor-metal photodetectors with low-temperature-grown cap layers'. Together they form a unique fingerprint.

Cite this