Abstract
An analytical model for short-channel MOSFET's including all second-order effects is proposed with a significant improvement on the saturation region operation. This model requires no numerical iterations and describes channel-length modulations of submicrometer MOS devices more accurately than other existing models. In addition, the influence of both the source-drain resistance and short-channel effects on the lateral channel electric field is also investigated.
Original language | English |
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Pages (from-to) | 2626-2629 |
Number of pages | 4 |
Journal | IEEE Transactions on Electron Devices |
Volume | 39 |
Issue number | 11 |
DOIs | |
State | Published - 11 1992 |
Externally published | Yes |