and characterization of metal-oxide-semiconductor capacitor with SiO2/high-k Al2O3/Si nanowire passivation layers

Chi-Hung Wu, Jen-Cheng Wang, Tzer-En Nee

Research output: Contribution to conference › Proceeding

Original language	American English
State	Published - 2009
Event	The 36th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-36) - Santa Barbara, California,USA Duration: 11 01 2009 → 15 01 2009

Conference	The 36th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-36)
Period	11/01/09 → 15/01/09

Cite this

@conference{97d5d9096ba3414481b03a921ff70f6d,

title = "and characterization of metal-oxide-semiconductor capacitor with SiO2/high-k Al2O3/Si nanowire passivation layers",

author = "Chi-Hung Wu and Jen-Cheng Wang and Tzer-En Nee",

year = "2009",

language = "American English",

note = "The 36th Conference on the Physics and Chemistry of Semiconductor Interfaces (PCSI-36) ; Conference date: 11-01-2009 Through 15-01-2009",

}