Antibacterial behavior of TaN-Ag nanocomposite thin films with and without annealing

  • J. H. Hsieh
  • , C. C. Tseng
  • , Y. K. Chang
  • , S. Y. Chang
  • , W. Wu*
  • *Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

56 Scopus citations

Abstract

TaN-Ag nanocomposite films were deposited by reactive cosputtering on Si. The films were then annealed using RTA (rapid thermal annealing) at 350 °C for 2, 4 and 8 min respectively to induce the nucleation and growth of Ag particles in TaN matrix and on film surface. FESEM (field emission scanning electron microscopy) were applied to characterize Ag nanoparticles emerged on the surface of TaN-Ag thin films. The effect of annealing on the antibacterial properties of these films was studied. The results first confirm that annealing by RTA can cause Ag nanoparticles with various sizes to emerge on the TaN surface. Consequently, the antibacterial behavior will vary, depending on the amount and size of the surfaced Ag particles.

Original languageEnglish
Pages (from-to)5586-5589
Number of pages4
JournalSurface and Coatings Technology
Volume202
Issue number22-23
DOIs
StatePublished - 30 08 2008
Externally publishedYes

Keywords

  • C-AFM
  • Cosputtering
  • Nanocomposite thin films
  • TaN-Ag

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