Abstract
The purpose of this study is to establish an analytical method for the simultaneous measurement of various acidic airborne contaminants in class 1 cleanrooms of a semiconductor fabrication facility (Fab). Acidic contaminants in air samples were adsorbed on silica gel tubes, extracted with carbonate- hydrogencarbonate solutions, and analyzed by ion chromatography. The recovery of HF was 100% and that of HCl was 91~100%. The method shows high resolution and sensitivity, and is capable for air analysis in the class 1 cleanroom. Different locations inside the cleanroom show deviations in the contaminant levels, indicating that the air quality is not the same throughout the cleanroom. The wet chemical station shows higher levels of contaminant concentrations than the other two areas. Each location also shows day-to-day variation.
| Original language | English |
|---|---|
| Pages (from-to) | 273-278 |
| Number of pages | 6 |
| Journal | Journal of Chromatography A |
| Volume | 804 |
| Issue number | 1-2 |
| DOIs | |
| State | Published - 24 04 1998 |
Keywords
- Acids
- Air analysis
- Inorganic anions
- Sample preparation
- Semiconductors
