Bioapplication of TiN thin films deposited using high power impulse magnetron sputtering

Wan Yu Wu*, Man Yee Chan, Yu Hsuan Hsu, Guan Zhen Chen, Shu Chuan Liao, Cheng Hung Lee, Ping Wing Lui

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

37 Scopus citations


Titanium nitride (TiN) has been deposited on TiAl6V4 using a reactive high-power impulse magnetron sputtering (HiPIMS) deposition technique and investigated for use as a bio-coating. During HiPIMS deposition, the peak current of the Ti target was varied from 75 to 175 A through adjusting the frequency from 200 to 100 Hz. Plasma diagnosis shows that, as compared to DC sputtering deposition process, all the peak currents and maximum powers are higher in the HiPIMS deposition process. The high peak current and maximum power in the HiPIMS process help the ionization of the sputtered Ti and also increase the amount of N 2 + species in the plasma, hence leading to a high N/Ti ratio of the TiN film. Therefore, the resulting TiN exhibits great corrosion resistance in simulated bodily fluid and shows excellent cell viability against the osteoblast-like MG-63 cells among other TiN samples.

Original languageEnglish
Pages (from-to)167-175
Number of pages9
JournalSurface and Coatings Technology
StatePublished - 25 03 2019
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2019 Elsevier B.V.


  • Cell viability
  • HiPIMS
  • MG-63
  • TiN


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