Bioapplication of TiN thin films deposited using high power impulse magnetron sputtering

Wan Yu Wu; Man Yee Chan; Yu Hsuan Hsu; Guan Zhen Chen; Shu Chuan Liao; Cheng Hung Lee; Ping Wing Lui

doi:10.1016/j.surfcoat.2019.01.106

Bioapplication of TiN thin films deposited using high power impulse magnetron sputtering

Wan Yu Wu^*, Man Yee Chan, Yu Hsuan Hsu, Guan Zhen Chen, Shu Chuan Liao, Cheng Hung Lee, Ping Wing Lui

^*Corresponding author for this work

Research output: Contribution to journal › Journal Article › peer-review

43 Scopus citations

Abstract

Titanium nitride (TiN) has been deposited on TiAl6V4 using a reactive high-power impulse magnetron sputtering (HiPIMS) deposition technique and investigated for use as a bio-coating. During HiPIMS deposition, the peak current of the Ti target was varied from 75 to 175 A through adjusting the frequency from 200 to 100 Hz. Plasma diagnosis shows that, as compared to DC sputtering deposition process, all the peak currents and maximum powers are higher in the HiPIMS deposition process. The high peak current and maximum power in the HiPIMS process help the ionization of the sputtered Ti and also increase the amount of N ₂ ⁺ species in the plasma, hence leading to a high N/Ti ratio of the TiN film. Therefore, the resulting TiN exhibits great corrosion resistance in simulated bodily fluid and shows excellent cell viability against the osteoblast-like MG-63 cells among other TiN samples.

Original language	English
Pages (from-to)	167-175
Number of pages	9
Journal	Surface and Coatings Technology
Volume	362
DOIs	https://doi.org/10.1016/j.surfcoat.2019.01.106
State	Published - 25 03 2019
Externally published	Yes

Bibliographical note

Publisher Copyright:
© 2019 Elsevier B.V.

Keywords

Cell viability
HiPIMS
MG-63
TiN

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@article{171de45e92474af485d46043b6b7d717,

title = "Bioapplication of TiN thin films deposited using high power impulse magnetron sputtering",

abstract = " Titanium nitride (TiN) has been deposited on TiAl6V4 using a reactive high-power impulse magnetron sputtering (HiPIMS) deposition technique and investigated for use as a bio-coating. During HiPIMS deposition, the peak current of the Ti target was varied from 75 to 175 A through adjusting the frequency from 200 to 100 Hz. Plasma diagnosis shows that, as compared to DC sputtering deposition process, all the peak currents and maximum powers are higher in the HiPIMS deposition process. The high peak current and maximum power in the HiPIMS process help the ionization of the sputtered Ti and also increase the amount of N 2 + species in the plasma, hence leading to a high N/Ti ratio of the TiN film. Therefore, the resulting TiN exhibits great corrosion resistance in simulated bodily fluid and shows excellent cell viability against the osteoblast-like MG-63 cells among other TiN samples.",

keywords = "Cell viability, HiPIMS, MG-63, TiN",

author = "Wu, {Wan Yu} and Chan, {Man Yee} and Hsu, {Yu Hsuan} and Chen, {Guan Zhen} and Liao, {Shu Chuan} and Lee, {Cheng Hung} and Lui, {Ping Wing}",

note = "Publisher Copyright: {\textcopyright} 2019 Elsevier B.V.",

year = "2019",

month = mar,

day = "25",

doi = "10.1016/j.surfcoat.2019.01.106",

language = "英语",

volume = "362",

pages = "167--175",

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TY - JOUR

T1 - Bioapplication of TiN thin films deposited using high power impulse magnetron sputtering

AU - Wu, Wan Yu

AU - Chan, Man Yee

AU - Hsu, Yu Hsuan

AU - Chen, Guan Zhen

AU - Liao, Shu Chuan

AU - Lee, Cheng Hung

AU - Lui, Ping Wing

PY - 2019/3/25

Y1 - 2019/3/25

N2 - Titanium nitride (TiN) has been deposited on TiAl6V4 using a reactive high-power impulse magnetron sputtering (HiPIMS) deposition technique and investigated for use as a bio-coating. During HiPIMS deposition, the peak current of the Ti target was varied from 75 to 175 A through adjusting the frequency from 200 to 100 Hz. Plasma diagnosis shows that, as compared to DC sputtering deposition process, all the peak currents and maximum powers are higher in the HiPIMS deposition process. The high peak current and maximum power in the HiPIMS process help the ionization of the sputtered Ti and also increase the amount of N 2 + species in the plasma, hence leading to a high N/Ti ratio of the TiN film. Therefore, the resulting TiN exhibits great corrosion resistance in simulated bodily fluid and shows excellent cell viability against the osteoblast-like MG-63 cells among other TiN samples.

AB - Titanium nitride (TiN) has been deposited on TiAl6V4 using a reactive high-power impulse magnetron sputtering (HiPIMS) deposition technique and investigated for use as a bio-coating. During HiPIMS deposition, the peak current of the Ti target was varied from 75 to 175 A through adjusting the frequency from 200 to 100 Hz. Plasma diagnosis shows that, as compared to DC sputtering deposition process, all the peak currents and maximum powers are higher in the HiPIMS deposition process. The high peak current and maximum power in the HiPIMS process help the ionization of the sputtered Ti and also increase the amount of N 2 + species in the plasma, hence leading to a high N/Ti ratio of the TiN film. Therefore, the resulting TiN exhibits great corrosion resistance in simulated bodily fluid and shows excellent cell viability against the osteoblast-like MG-63 cells among other TiN samples.

KW - Cell viability

KW - HiPIMS

KW - MG-63

KW - TiN

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U2 - 10.1016/j.surfcoat.2019.01.106

DO - 10.1016/j.surfcoat.2019.01.106

M3 - 文章

AN - SCOPUS:85060860393

SN - 0257-8972

VL - 362

SP - 167

EP - 175

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Bioapplication of TiN thin films deposited using high power impulse magnetron sputtering

Abstract

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Keywords

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