Black's equation for today's ULSI interconnect Electromigration reliability - A revisit

Wei Li*, Cher Ming Tan

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

14 Scopus citations

Abstract

Electromigration (EM) is an important failure mechanism in Ultra-Large-Scale Integration (ULSI) interconnections. The Black's equation is a simple empirical EM model, which is widely accepted in the industry as the most common method to extrapolate the median time to failure (MTF) from the accelerated test condition to the normal operating condition. Although the empirical model of the Black's equation is simple in implementation, its validity has been a great controversy in the literature and will be described later. In this work, we revisit the Black's equation for its success in the industry and its validity. In the presence of the additional driving forces and other important Electromigration physics which are not considered in the Black's equation for today ULSI interconnects, the application of the Black's equation for today's ULSI interconnects become inaccurate as shown experimentally. An alternative model based on the physics-based Electromigration simulation and Eyring model in extrapolation is proposed in this work.

Original languageEnglish
Title of host publication2011 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2011
DOIs
StatePublished - 2011
Externally publishedYes
Event2011 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2011 - Tianjin, China
Duration: 17 11 201118 11 2011

Publication series

Name2011 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2011

Conference

Conference2011 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2011
Country/TerritoryChina
CityTianjin
Period17/11/1118/11/11

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