Calculation of sputtering rate by a Monte Carlo method

J. H. Hsieh; C. Li

doi:10.1023/A:1025114725607

Calculation of sputtering rate by a Monte Carlo method

J. H. Hsieh^*, C. Li

^*Corresponding author for this work

Nanyang Technological University

Research output: Contribution to journal › Journal Article › peer-review

2 Scopus citations

Abstract

The sputtering rate during a plasma-assisted process was calculated. Monte Carlo simulation was used for the calculation. It was observed that sputtering was one of the most important mechanisms occurring on the cathod during a plasma-assisted process.

Original language	English
Pages (from-to)	1125-1126
Number of pages	2
Journal	Journal of Materials Science Letters
Volume	22
Issue number	16
DOIs	https://doi.org/10.1023/A:1025114725607
State	Published - 15 08 2003
Externally published	Yes

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title = "Calculation of sputtering rate by a Monte Carlo method",

abstract = "The sputtering rate during a plasma-assisted process was calculated. Monte Carlo simulation was used for the calculation. It was observed that sputtering was one of the most important mechanisms occurring on the cathod during a plasma-assisted process.",

author = "Hsieh, {J. H.} and C. Li",

year = "2003",

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AU - Li, C.

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N2 - The sputtering rate during a plasma-assisted process was calculated. Monte Carlo simulation was used for the calculation. It was observed that sputtering was one of the most important mechanisms occurring on the cathod during a plasma-assisted process.

AB - The sputtering rate during a plasma-assisted process was calculated. Monte Carlo simulation was used for the calculation. It was observed that sputtering was one of the most important mechanisms occurring on the cathod during a plasma-assisted process.

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DO - 10.1023/A:1025114725607

M3 - 文章

AN - SCOPUS:0141793194

SN - 0261-8028

VL - 22

SP - 1125

EP - 1126

JO - Journal of Materials Science Letters

JF - Journal of Materials Science Letters

IS - 16

ER -

Calculation of sputtering rate by a Monte Carlo method

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