CF4 Plasma Treatment on Gd2O3 Nanocrystal Memory for High Performance Nonvolatile Memory Application

Chih-Ting Lin, Jer-Chyi Wang, Chao-Sung Lai, Jui-Lin Hsu, Chi-Fong Ai

Research output: Contribution to conference › Proceeding

Original language	American English
State	Published - 2010
Event	217th Electrochemical Society (ECS) Meeting - Vancouver, BC, Canada Duration: 25 04 2010 → 30 04 2010

Conference	217th Electrochemical Society (ECS) Meeting
Period	25/04/10 → 30/04/10

Cite this

@conference{0c1120f8fa5f4c84b7c32740514656c5,

title = "CF4 Plasma Treatment on Gd2O3 Nanocrystal Memory for High Performance Nonvolatile Memory Application",

author = "Chih-Ting Lin and Jer-Chyi Wang and Chao-Sung Lai and Jui-Lin Hsu and Chi-Fong Ai",

year = "2010",

language = "American English",

note = "217th Electrochemical Society (ECS) Meeting ; Conference date: 25-04-2010 Through 30-04-2010",

}