CF4 plasma treated poly-Si film by PECVD for high-k PrTiO 3 poly-Si TFTs

Tung Ming Pan; Chih Jen Chang; Ching Lin Chan; Sheng Han Su; Wu Ching Lin

doi:10.1109/ISDRS.2009.5378022

CF₄ plasma treated poly-Si film by PECVD for high-k PrTiO ₃ poly-Si TFTs

Tung Ming Pan^*, Chih Jen Chang, Ching Lin Chan, Sheng Han Su, Wu Ching Lin

^*Corresponding author for this work

Department of Electronic Engineering

Chang Gung University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Original language	English
Title of host publication	2009 International Semiconductor Device Research Symposium, ISDRS '09
DOIs	https://doi.org/10.1109/ISDRS.2009.5378022
State	Published - 2009
Event	2009 International Semiconductor Device Research Symposium, ISDRS '09 - College Park, MD, United States Duration: 09 12 2009 → 11 12 2009

Publication series

Name	2009 International Semiconductor Device Research Symposium, ISDRS '09

Conference

Conference	2009 International Semiconductor Device Research Symposium, ISDRS '09
Country/Territory	United States
City	College Park, MD
Period	09/12/09 → 11/12/09

Access to Document

10.1109/ISDRS.2009.5378022

Cite this

@inproceedings{d0e25e1c762f4a9c9f58ad2b1e4ddd94,

title = "CF4 plasma treated poly-Si film by PECVD for high-k PrTiO 3 poly-Si TFTs",

author = "Pan, {Tung Ming} and Chang, {Chih Jen} and Chan, {Ching Lin} and Su, {Sheng Han} and Lin, {Wu Ching}",

year = "2009",

doi = "10.1109/ISDRS.2009.5378022",

language = "英语",

isbn = "9781424460304",

series = "2009 International Semiconductor Device Research Symposium, ISDRS '09",

booktitle = "2009 International Semiconductor Device Research Symposium, ISDRS '09",

note = "2009 International Semiconductor Device Research Symposium, ISDRS '09 ; Conference date: 09-12-2009 Through 11-12-2009",

}

Pan, TM, Chang, CJ, Chan, CL, Su, SH & Lin, WC 2009, CF₄ plasma treated poly-Si film by PECVD for high-k PrTiO ₃ poly-Si TFTs. in 2009 International Semiconductor Device Research Symposium, ISDRS '09., 5378022, 2009 International Semiconductor Device Research Symposium, ISDRS '09, 2009 International Semiconductor Device Research Symposium, ISDRS '09, College Park, MD, United States, 09/12/09. https://doi.org/10.1109/ISDRS.2009.5378022

CF₄ plasma treated poly-Si film by PECVD for high-k PrTiO ₃ poly-Si TFTs. / Pan, Tung Ming; Chang, Chih Jen; Chan, Ching Lin et al.
2009 International Semiconductor Device Research Symposium, ISDRS '09. 2009. 5378022 (2009 International Semiconductor Device Research Symposium, ISDRS '09).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - CF4 plasma treated poly-Si film by PECVD for high-k PrTiO 3 poly-Si TFTs

AU - Pan, Tung Ming

AU - Chang, Chih Jen

AU - Chan, Ching Lin

AU - Su, Sheng Han

AU - Lin, Wu Ching

PY - 2009

Y1 - 2009

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U2 - 10.1109/ISDRS.2009.5378022

DO - 10.1109/ISDRS.2009.5378022

M3 - 会议稿件

AN - SCOPUS:77949382459

SN - 9781424460304

T3 - 2009 International Semiconductor Device Research Symposium, ISDRS '09

BT - 2009 International Semiconductor Device Research Symposium, ISDRS '09

T2 - 2009 International Semiconductor Device Research Symposium, ISDRS '09

Y2 - 9 December 2009 through 11 December 2009

ER -