Characteristics Improvement of N2O Annealing on Tungsten Nanocrystal Memory with W/Si Dual-Sputtering Method

Research output: Contribution to conference › Proceeding

Original language	American English
State	Published - 2009
Event	2009 International Electron Devices and Materials Symposia - Taoyuan, Taiwan Duration: 19 11 2009 → 20 11 2009

Conference	2009 International Electron Devices and Materials Symposia
Period	19/11/09 → 20/11/09

Cite this

@conference{c4792db222fc4100853d271956fceaa0,

title = "Characteristics Improvement of N2O Annealing on Tungsten Nanocrystal Memory with W/Si Dual-Sputtering Method",

author = "Pai-Chi Chou and Jer-Chyi Wang and Chao-Sung Lai",

year = "2009",

language = "American English",

note = "2009 International Electron Devices and Materials Symposia ; Conference date: 19-11-2009 Through 20-11-2009",

}