Characteristics of High-k Gate Dielectrics by RF sputtering deposited on the polycrystalline silicon

邱景祥

Research output: Types of ThesisMaster's thesis

Translated title of the contribution射頻濺鍍高介電閘極絕緣層在複晶矽薄膜上之特性
Original languageAmerican English
Supervisors/Advisors
  • Kao, Chyuan-Haur, Supervisor
StatePublished - 2009
Externally publishedYes

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