Abstract
Cr-Ni multilayers with thickness modulation of several tens of nanometers were prepared by pulse-current electroplating from a Cr(III)-Ni(II) bath at 30 °C. The Cr-Ni multilayers were composed of alternate amorphous Cr-rich and nanocrystalline Ni-rich layers. This amorphous Cr-rich layer could be attributed to a reduction in the complex-formed Cr ion, which leads to the presence of C, a glass-forming element, in the Cr-rich deposit during electrodeposition. Twins were found in the nanosized Ni-rich layer, in which stacking faults were frequently observed.
Original language | English |
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Pages (from-to) | 61-64 |
Number of pages | 4 |
Journal | Scripta Materialia |
Volume | 57 |
Issue number | 1 |
DOIs | |
State | Published - 07 2007 |
Keywords
- Cr-Ni multilayers
- Electroplating
- Microstructure