Characterization of Cr-Ni multilayers electroplated from a chromium(III)-nickel(II) bath using pulse current

Ching An Huang*, Chao Yu Chen, Chun Ching Hsu, Chao Sung Lin

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

33 Scopus citations

Abstract

Cr-Ni multilayers with thickness modulation of several tens of nanometers were prepared by pulse-current electroplating from a Cr(III)-Ni(II) bath at 30 °C. The Cr-Ni multilayers were composed of alternate amorphous Cr-rich and nanocrystalline Ni-rich layers. This amorphous Cr-rich layer could be attributed to a reduction in the complex-formed Cr ion, which leads to the presence of C, a glass-forming element, in the Cr-rich deposit during electrodeposition. Twins were found in the nanosized Ni-rich layer, in which stacking faults were frequently observed.

Original languageEnglish
Pages (from-to)61-64
Number of pages4
JournalScripta Materialia
Volume57
Issue number1
DOIs
StatePublished - 07 2007

Keywords

  • Cr-Ni multilayers
  • Electroplating
  • Microstructure

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