Characterization of Cr-Ni multilayers electroplated from a chromium(III)-nickel(II) bath using pulse current

Ching An Huang; Chao Yu Chen; Chun Ching Hsu; Chao Sung Lin

doi:10.1016/j.scriptamat.2007.02.004

Characterization of Cr-Ni multilayers electroplated from a chromium(III)-nickel(II) bath using pulse current

Ching An Huang^*
, Chao Yu Chen
, Chun Ching Hsu
, Chao Sung Lin

^*Corresponding author for this work

Department of Mechanical Engineering

Research output: Contribution to journal › Journal Article › peer-review

33 Scopus citations

Abstract

Cr-Ni multilayers with thickness modulation of several tens of nanometers were prepared by pulse-current electroplating from a Cr(III)-Ni(II) bath at 30 °C. The Cr-Ni multilayers were composed of alternate amorphous Cr-rich and nanocrystalline Ni-rich layers. This amorphous Cr-rich layer could be attributed to a reduction in the complex-formed Cr ion, which leads to the presence of C, a glass-forming element, in the Cr-rich deposit during electrodeposition. Twins were found in the nanosized Ni-rich layer, in which stacking faults were frequently observed.

Original language	English
Pages (from-to)	61-64
Number of pages	4
Journal	Scripta Materialia
Volume	57
Issue number	1
DOIs	https://doi.org/10.1016/j.scriptamat.2007.02.004
State	Published - 07 2007

Keywords

Cr-Ni multilayers
Electroplating
Microstructure

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10.1016/j.scriptamat.2007.02.004

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@article{ae84fc01a70b4ae4aa99baf96584f979,

title = "Characterization of Cr-Ni multilayers electroplated from a chromium(III)-nickel(II) bath using pulse current",

abstract = "Cr-Ni multilayers with thickness modulation of several tens of nanometers were prepared by pulse-current electroplating from a Cr(III)-Ni(II) bath at 30 °C. The Cr-Ni multilayers were composed of alternate amorphous Cr-rich and nanocrystalline Ni-rich layers. This amorphous Cr-rich layer could be attributed to a reduction in the complex-formed Cr ion, which leads to the presence of C, a glass-forming element, in the Cr-rich deposit during electrodeposition. Twins were found in the nanosized Ni-rich layer, in which stacking faults were frequently observed.",

keywords = "Cr-Ni multilayers, Electroplating, Microstructure",

author = "Huang, \{Ching An\} and Chen, \{Chao Yu\} and Hsu, \{Chun Ching\} and Lin, \{Chao Sung\}",

year = "2007",

month = jul,

doi = "10.1016/j.scriptamat.2007.02.004",

language = "英语",

volume = "57",

pages = "61--64",

journal = "Scripta Materialia",

issn = "1359-6462",

publisher = "Acta Materialia Inc",

number = "1",

}

TY - JOUR

T1 - Characterization of Cr-Ni multilayers electroplated from a chromium(III)-nickel(II) bath using pulse current

AU - Huang, Ching An

AU - Chen, Chao Yu

AU - Hsu, Chun Ching

AU - Lin, Chao Sung

PY - 2007/7

Y1 - 2007/7

N2 - Cr-Ni multilayers with thickness modulation of several tens of nanometers were prepared by pulse-current electroplating from a Cr(III)-Ni(II) bath at 30 °C. The Cr-Ni multilayers were composed of alternate amorphous Cr-rich and nanocrystalline Ni-rich layers. This amorphous Cr-rich layer could be attributed to a reduction in the complex-formed Cr ion, which leads to the presence of C, a glass-forming element, in the Cr-rich deposit during electrodeposition. Twins were found in the nanosized Ni-rich layer, in which stacking faults were frequently observed.

AB - Cr-Ni multilayers with thickness modulation of several tens of nanometers were prepared by pulse-current electroplating from a Cr(III)-Ni(II) bath at 30 °C. The Cr-Ni multilayers were composed of alternate amorphous Cr-rich and nanocrystalline Ni-rich layers. This amorphous Cr-rich layer could be attributed to a reduction in the complex-formed Cr ion, which leads to the presence of C, a glass-forming element, in the Cr-rich deposit during electrodeposition. Twins were found in the nanosized Ni-rich layer, in which stacking faults were frequently observed.

KW - Cr-Ni multilayers

KW - Electroplating

KW - Microstructure

UR - https://www.scopus.com/pages/publications/34247232194

U2 - 10.1016/j.scriptamat.2007.02.004

DO - 10.1016/j.scriptamat.2007.02.004

M3 - 文章

AN - SCOPUS:34247232194

SN - 1359-6462

VL - 57

SP - 61

EP - 64

JO - Scripta Materialia

JF - Scripta Materialia

IS - 1

ER -

Characterization of Cr-Ni multilayers electroplated from a chromium(III)-nickel(II) bath using pulse current

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Keywords

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