| Translated title of the contribution | 具氮化與氟化之金屬功函數調整與高介電係數層特性研究 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2011 |
| Externally published | Yes |
Characterization of Metal Gate Work Function Modulation with High-k Gate Dielectrics by Nitrogen and Fluorine Incorporation
彭興淦
Research output: Types of Thesis › Doctoral thesis