Characterization of Pr2O3 added metals/GaAs Schottky diodes using X-ray photoelectron spectroscopy

Hung Thung Wang*, Liann Be Chang, Yi Chang Cheng, Yin Kwang Lin, Chung I.G. Hsu

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

2 Scopus citations

Abstract

In this research, the surface chemical structures of Pr2O3 doped Liquid Phase Epitaxy (LPE) layers were investigated by X-ray Photoelectron Spectroscopy (XPS). The bonding energies of these grown surfaces are studied under various adding conditions. The comparisons of these surface chemical structures were used to explain the evolutions of the grown surfaces with their effects on the Schottky barrier height. Because the surface states are lowered and the Fermi level is not pinned, these metals (Au, Ag, Ni, Pt)/GaAs Schottky structures all show an improved diode performance by adding Pr2O3. The resulting barrier height and ideality factor, as estimated by the current-voltage measurement, can be as high as 0.94±0.02 eV and as unitary as 1.03±0.01, respectively.

Original languageEnglish
Pages (from-to)1017-1021
Number of pages5
JournalCrystal Research and Technology
Volume34
Issue number8
DOIs
StatePublished - 1999
Externally publishedYes

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