@conference{23d9c0a786f348609040de54c80fc490,
title = "Charge storage characteristics of ALD high-k HfO2/TiO2/HfO2 multilayer quantum well flash memory devices for nanoscale NAND applications",
author = "Siddheswar Maikap and Rahaman, {S. Z.} and W. Banerjee and A. Das and Lin, {C. H.} and Tzeng, {P. J.} and Tzeng, {S. S.} and Li, {P. W.} and Tsai, {M. J.}",
year = "2008",
language = "American English",
note = "2008 International Electron Devices and Materials Symposia (IEDMS 2008) ; Conference date: 28-11-2008 Through 29-11-2008",
}