Combined magnetron sputtering and ECR-CVD deposition of diamond-like carbon films

J. F. Chang; H. Y. Ueng; T. F. Young; Y. C. Wang; W. C. Hwang

doi:10.1016/S0257-8972(02)00157-3

Combined magnetron sputtering and ECR-CVD deposition of diamond-like carbon films

J. F. Chang, H. Y. Ueng, T. F. Young, Y. C. Wang, W. C. Hwang^*

^*Corresponding author for this work

Research output: Contribution to journal › Journal Article › peer-review

20 Scopus citations

Abstract

A novel hybrid technique for diamond-like carbon (DLC) film deposition has been developed, which combines the electron cyclotron resonance microwave plasma discharge of C₂H₂ and metallic magnetron sputtering. In this paper we report our study of this method. The effects of negative bias voltage and hydrocarbon flow rate for the deposition of a-C:H films on high-speed steel were examined by Raman spectra and their hardness was investigated by the Rockwell method. The Raman spectra show that at different hydrocarbon flow rates, the variation of the G line peak and width, and the integrated intensity ratio I_D/I_G of DLC and graphic, correlate well with the film hardness. Consequently, we suggest a deposition mechanism of DLC for this combined method.

Original language	English
Pages (from-to)	179-184
Number of pages	6
Journal	Surface and Coatings Technology
Volume	157
Issue number	2-3
DOIs	https://doi.org/10.1016/S0257-8972(02)00157-3
State	Published - 22 08 2002
Externally published	Yes

Keywords

Diamond-like carbon (DLC)
ECR
Raman
Sputtering

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10.1016/S0257-8972(02)00157-3

Cite this

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title = "Combined magnetron sputtering and ECR-CVD deposition of diamond-like carbon films",

abstract = "A novel hybrid technique for diamond-like carbon (DLC) film deposition has been developed, which combines the electron cyclotron resonance microwave plasma discharge of C2H2 and metallic magnetron sputtering. In this paper we report our study of this method. The effects of negative bias voltage and hydrocarbon flow rate for the deposition of a-C:H films on high-speed steel were examined by Raman spectra and their hardness was investigated by the Rockwell method. The Raman spectra show that at different hydrocarbon flow rates, the variation of the G line peak and width, and the integrated intensity ratio ID/IG of DLC and graphic, correlate well with the film hardness. Consequently, we suggest a deposition mechanism of DLC for this combined method.",

keywords = "Diamond-like carbon (DLC), ECR, Raman, Sputtering",

author = "Chang, {J. F.} and Ueng, {H. Y.} and Young, {T. F.} and Wang, {Y. C.} and Hwang, {W. C.}",

year = "2002",

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pages = "179--184",

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TY - JOUR

T1 - Combined magnetron sputtering and ECR-CVD deposition of diamond-like carbon films

AU - Chang, J. F.

AU - Ueng, H. Y.

AU - Young, T. F.

AU - Wang, Y. C.

AU - Hwang, W. C.

PY - 2002/8/22

Y1 - 2002/8/22

N2 - A novel hybrid technique for diamond-like carbon (DLC) film deposition has been developed, which combines the electron cyclotron resonance microwave plasma discharge of C2H2 and metallic magnetron sputtering. In this paper we report our study of this method. The effects of negative bias voltage and hydrocarbon flow rate for the deposition of a-C:H films on high-speed steel were examined by Raman spectra and their hardness was investigated by the Rockwell method. The Raman spectra show that at different hydrocarbon flow rates, the variation of the G line peak and width, and the integrated intensity ratio ID/IG of DLC and graphic, correlate well with the film hardness. Consequently, we suggest a deposition mechanism of DLC for this combined method.

AB - A novel hybrid technique for diamond-like carbon (DLC) film deposition has been developed, which combines the electron cyclotron resonance microwave plasma discharge of C2H2 and metallic magnetron sputtering. In this paper we report our study of this method. The effects of negative bias voltage and hydrocarbon flow rate for the deposition of a-C:H films on high-speed steel were examined by Raman spectra and their hardness was investigated by the Rockwell method. The Raman spectra show that at different hydrocarbon flow rates, the variation of the G line peak and width, and the integrated intensity ratio ID/IG of DLC and graphic, correlate well with the film hardness. Consequently, we suggest a deposition mechanism of DLC for this combined method.

KW - Diamond-like carbon (DLC)

KW - ECR

KW - Raman

KW - Sputtering

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U2 - 10.1016/S0257-8972(02)00157-3

DO - 10.1016/S0257-8972(02)00157-3

M3 - 文章

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SN - 0257-8972

VL - 157

SP - 179

EP - 184

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 2-3

ER -

Combined magnetron sputtering and ECR-CVD deposition of diamond-like carbon films

Abstract

Keywords

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