| Translated title of the contribution | 射頻濺鍍與電子束蒸鍍兩種方法沉積三氧化二鐠之閘介電層電性比較 |
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| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2006 |
| Externally published | Yes |
Comparison of electrical characteristics of praseodymium oxide gate dielectrics for rf-sputtering and e-beam methods
蔡豐磯
Research output: Types of Thesis › Master's thesis