Contact resistance reduction in periphery circuit of DRAM by the optimization on silicide process

Research output: Contribution to conference › Proceeding

Original language	American English
State	Published - 2012
Event	The 10th Annual Meeting of Formosa Group of Companies on Applied Engineering Technology - Taipei, Taiwan Duration: 21 06 2012 → 21 06 2012

Conference	The 10th Annual Meeting of Formosa Group of Companies on Applied Engineering Technology
Period	21/06/12 → 21/06/12

Cite this

@conference{fcfe194420a8459b9a5452e63f3983f2,

title = "Contact resistance reduction in periphery circuit of DRAM by the optimization on silicide process",

author = "Chia-Ming Yang",

year = "2012",

language = "American English",

note = "The 10th Annual Meeting of Formosa Group of Companies on Applied Engineering Technology ; Conference date: 21-06-2012 Through 21-06-2012",

}