Abstract
Thermionically assisted triode ion plating (TATIP) was used to deposit Cr coatings at various cathode current densities under constant bias voltages of 500 and 3000 V. The results show that the coating's properties are a function of bias voltage which controls the energy of bombarding particles, and cathode current density which controls the flux of bombarding particles. In addition to the study of constant-bias TATIP, a variable-bias TATIP process was investigated. This process is designed to enhance film/substrate adhesion through high-bias voltage while retaining the beneficial effects of low-bias TATIP. These processes and the resultant coating properties are described and discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 239-250 |
| Number of pages | 12 |
| Journal | Materials and Manufacturing Processes |
| Volume | 7 |
| Issue number | 2 |
| DOIs | |
| State | Published - 01 01 1992 |
| Externally published | Yes |