Abstract
We demonstrate a novel structure of electroabsorption modulator (EAM) at a 1.55-μm wavelength: the dual-depletion-region EAM. After an n+ delta-doped layer was inserted into the thick intrinsic region (550 nm) of a tradition p-i-n modulator, the tradeoff between driving-voltage and electrical bandwidth performance can be released effectively. This new structure can also release the burden imposed on downscaling the width or length of high-speed EAM with low driving-voltage performance. The microwave and electrical-to-optical measurement of this novel device with traveling-wave electrodes show very convincing results.
Original language | English |
---|---|
Pages (from-to) | 2068-2070 |
Number of pages | 3 |
Journal | IEEE Photonics Technology Letters |
Volume | 17 |
Issue number | 10 |
DOIs | |
State | Published - 10 2005 |
Externally published | Yes |
Keywords
- Electroabsorption modulators (EAMs)
- Multiple quantum-well (MQW)
- Optical communication