Demonstration of a dual-depletion-region electroabsorption modulator at 1.55-μm wavelength for high-speed and low-driving-voltage performance

  • J. W. Shi*
  • , C. A. Hsieh
  • , A. C. Shiao
  • , Y. S. Wu
  • , F. H. Huang
  • , S. H. Chen
  • , Y. T. Tsai
  • , J. I. Chyi
  • *Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

15 Scopus citations

Abstract

We demonstrate a novel structure of electroabsorption modulator (EAM) at a 1.55-μm wavelength: the dual-depletion-region EAM. After an n+ delta-doped layer was inserted into the thick intrinsic region (550 nm) of a tradition p-i-n modulator, the tradeoff between driving-voltage and electrical bandwidth performance can be released effectively. This new structure can also release the burden imposed on downscaling the width or length of high-speed EAM with low driving-voltage performance. The microwave and electrical-to-optical measurement of this novel device with traveling-wave electrodes show very convincing results.

Original languageEnglish
Pages (from-to)2068-2070
Number of pages3
JournalIEEE Photonics Technology Letters
Volume17
Issue number10
DOIs
StatePublished - 10 2005
Externally publishedYes

Keywords

  • Electroabsorption modulators (EAMs)
  • Multiple quantum-well (MQW)
  • Optical communication

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