Design and evaluation of a minienvironment for semiconductor manufacture processes

S. C. Hu; Y. K. Chuah; M. C. Yen

doi:10.1016/S0360-1323(00)00095-0

Design and evaluation of a minienvironment for semiconductor manufacture processes

S. C. Hu^*, Y. K. Chuah, M. C. Yen

^*Corresponding author for this work

National Taipei University of Technology

Research output: Contribution to journal › Journal Article › peer-review

49 Scopus citations

Abstract

A new minienvironment for controlling the process area from ambient air contamination was designed and evaluated. The new design has a buffer zone between the ambient and the process zones. A parametric study of this design using a Computational Fluid Dynamics (CFD) method was conducted for various cases. A full-scale experimental model was fabricated. The evaluation was completed by measurements of airflow patterns, zone pressure differentials and particle concentration levels for the fabricated minienvironment. It is concluded that this new minienvironment is capable of maintaining a cleanliness of less than one particle per cubic meter, and the buffer zone is effective in preventing cross contamination between the process and the ambient zones.

Original language	English
Pages (from-to)	201-208
Number of pages	8
Journal	Building and Environment
Volume	37
Issue number	2
DOIs	https://doi.org/10.1016/S0360-1323(00)00095-0
State	Published - 02 2002
Externally published	Yes

Keywords

Cleanroom
Contamination
Minienvironment
SMIF

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10.1016/S0360-1323(00)00095-0

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title = "Design and evaluation of a minienvironment for semiconductor manufacture processes",

abstract = "A new minienvironment for controlling the process area from ambient air contamination was designed and evaluated. The new design has a buffer zone between the ambient and the process zones. A parametric study of this design using a Computational Fluid Dynamics (CFD) method was conducted for various cases. A full-scale experimental model was fabricated. The evaluation was completed by measurements of airflow patterns, zone pressure differentials and particle concentration levels for the fabricated minienvironment. It is concluded that this new minienvironment is capable of maintaining a cleanliness of less than one particle per cubic meter, and the buffer zone is effective in preventing cross contamination between the process and the ambient zones.",

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AU - Hu, S. C.

AU - Chuah, Y. K.

AU - Yen, M. C.

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Y1 - 2002/2

N2 - A new minienvironment for controlling the process area from ambient air contamination was designed and evaluated. The new design has a buffer zone between the ambient and the process zones. A parametric study of this design using a Computational Fluid Dynamics (CFD) method was conducted for various cases. A full-scale experimental model was fabricated. The evaluation was completed by measurements of airflow patterns, zone pressure differentials and particle concentration levels for the fabricated minienvironment. It is concluded that this new minienvironment is capable of maintaining a cleanliness of less than one particle per cubic meter, and the buffer zone is effective in preventing cross contamination between the process and the ambient zones.

AB - A new minienvironment for controlling the process area from ambient air contamination was designed and evaluated. The new design has a buffer zone between the ambient and the process zones. A parametric study of this design using a Computational Fluid Dynamics (CFD) method was conducted for various cases. A full-scale experimental model was fabricated. The evaluation was completed by measurements of airflow patterns, zone pressure differentials and particle concentration levels for the fabricated minienvironment. It is concluded that this new minienvironment is capable of maintaining a cleanliness of less than one particle per cubic meter, and the buffer zone is effective in preventing cross contamination between the process and the ambient zones.

KW - Cleanroom

KW - Contamination

KW - Minienvironment

KW - SMIF

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SN - 0360-1323

VL - 37

SP - 201

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JO - Building and Environment

JF - Building and Environment

IS - 2

ER -

Design and evaluation of a minienvironment for semiconductor manufacture processes

Abstract

Keywords

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