Development of an electrostatic discharge protection solution in gan technology

Zhixin Wang, Juin J. Liou, Kuan Liang Cho, Hsien Chin Chiu

Research output: Contribution to journalJournal Article peer-review

16 Scopus citations

Abstract

In this letter, a robust and effective gallium nitride (GaN)-pHEMT-based electrostatic discharge (ESD) protection structure is developed for the first time. The structure consists of a depletion-mode GaN pHEMT, a trigger diode chain, a pinchoff diode chain, and a current limiter. Results pertinent to critical ESD parameters, such as the trigger voltage, leakage current, on-state resistance, and robustness, are measured using the transmission line pulsing (TLP) tester. It is demonstrated that such an ESD clamp can sustain a TLP stress of up to 3 A. The two diode chains are found to play critical roles in determining the trigger voltage and leakage current. Increasing the trigger diode number increases the trigger voltage. On the other hand, adding more pinchoff diodes also increases the trigger voltage and simultaneously reduces the leakage current. The design tradeoffs for the proposed ESD clamp are also discussed.

Original languageEnglish
Article number6627941
Pages (from-to)1491-1493
Number of pages3
JournalIEEE Electron Device Letters
Volume34
Issue number12
DOIs
StatePublished - 12 2013

Keywords

  • Electrostatic discharge (ESD)
  • gallium nitride (GaN) technology
  • pHEMT

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