| Translated title of the contribution | 研發高介電常數介電層氮化釹及氮化鉺金屬閘極薄膜於互補式金屬氧化物半導體之應用 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2007 |
| Externally published | Yes |
Development of High-k NdN Dielectrics and Metal Gate ErN films for CMOS Applications
侯松儒
Research output: Types of Thesis › Master's thesis