| Translated title of the contribution | 氮化鎢介面層在鑭/鋯摻雜二氧化鉿薄膜上的介電和記憶體特性 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2022 |
| Externally published | Yes |
Dielectric and memory characteristics by using WNx interfacial layer on La/Zr doped HfO2 films
沈溢霖
Research output: Types of Thesis › Master's thesis