Dual-gate E/E- and E/D-Mode AlGaAs/InGaAs pHEMTs for microwave circuit applications

  • Dong Ming Lin*
  • , Cheng Kuo Lin
  • , Fan Hsiu Huang
  • , Jia Shyan Wu
  • , Wen Kai Wang
  • , Yu Yi Tsai
  • , Yi Jen Chan
  • , Yu Chi Wang
  • *Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

6 Scopus citations

Abstract

In this paper, we developed dual-gate enhancement/enhancement-mode (E/ E-mode) and enhancement/depletion-mode (E/D-mode) AlGaAs/InGaAs pHEMTs for high-voltage and high-power device applications. These dual-gate devices had a higher breakdown voltage (Vbr) and maximum oscillation frequency (fmax). This could be obtained because there were two depletion regions, and the total electrical field was shared between the two regions, leading to lower output conductance (go and lower gate-to-drain capacitance (Cgd). The dual-gate device can be operated at a higher drain-to-source voltage (Vds), resulting in better linear gain and output power performance, as compared to a conventional single-gate E-mode GaAs pHEMT device. The maximum oscillation frequency obtained using the dual-gate E/ E-mode device increased from 78 to 123 GHz. When operated at 2.4 GHz, the maximum RF output power of the single-gate E-mode and dual-gate E/ D-mode devices increased from 636 to 810 mW/mm, respectively. We also produced a 2.4-GHz high-gain and high-power density two-stage power amplifier using dual-gate E/E and E/D-mode transistors. A linear gain of 40 dB and a maximum output power of 24 dBm were obtained.

Original languageEnglish
Pages (from-to)1818-1824
Number of pages7
JournalIEEE Transactions on Electron Devices
Volume54
Issue number8
DOIs
StatePublished - 08 2007
Externally publishedYes

Keywords

  • AlGaAs/InGaAs
  • Dual gate
  • Enhancement
  • Power amplifiers
  • pHEMTs

Fingerprint

Dive into the research topics of 'Dual-gate E/E- and E/D-Mode AlGaAs/InGaAs pHEMTs for microwave circuit applications'. Together they form a unique fingerprint.

Cite this