Dynamic Modeling and Control of Wafer Temperature Distribution in a Vertical LPCVD Furnace

Gow-Bin Wang; J. J. Lan; C. H. Huang; C. Y. Chen; Y. S. Huang; T. C. Wang

Dynamic Modeling and Control of Wafer Temperature Distribution in a Vertical LPCVD Furnace

Gow-Bin Wang, J. J. Lan, C. H. Huang, C. Y. Chen, Y. S. Huang, T. C. Wang

Department of Chemical and Materials Engineering

Research output: Contribution to conference › Proceeding

Original language	American English
State	Published - 2010
Event	PSE ASIA 2010 – The 5th International Symposium on Design, Operation and Control of Chemical Processes - Singapore Duration: 25 07 2010 → 28 07 2010

Conference

Conference	PSE ASIA 2010 – The 5th International Symposium on Design, Operation and Control of Chemical Processes
Period	25/07/10 → 28/07/10

Cite this

@conference{dc80bee4639a4fc18acfd805d7034139,

title = "Dynamic Modeling and Control of Wafer Temperature Distribution in a Vertical LPCVD Furnace",

author = "Gow-Bin Wang and Lan, \{J. J.\} and Huang, \{C. H.\} and Chen, \{C. Y.\} and Huang, \{Y. S.\} and Wang, \{T. C.\}",

year = "2010",

language = "American English",

note = "PSE ASIA 2010 – The 5th International Symposium on Design, Operation and Control of Chemical Processes ; Conference date: 25-07-2010 Through 28-07-2010",

}

TY - CONF

T1 - Dynamic Modeling and Control of Wafer Temperature Distribution in a Vertical LPCVD Furnace

AU - Wang, Gow-Bin

AU - Lan, J. J.

AU - Huang, C. H.

AU - Chen, C. Y.

AU - Huang, Y. S.

AU - Wang, T. C.

PY - 2010

Y1 - 2010

M3 - Proceeding

T2 - PSE ASIA 2010 – The 5th International Symposium on Design, Operation and Control of Chemical Processes

Y2 - 25 July 2010 through 28 July 2010

ER -