Dynamic negative bias temperature instability in low-temperature poly-Si thin-film transistors

Chih Yang Chen*, Tong Yi Wang, Ming Wen Ma, Wei Cheng Chen, Hsiao Yi Lin, Kuan Lin Yeh, Shen De Wang, Tan Fu Lei

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Dynamic negative bias temperature instability in p-channel low-temperature poly-Si thin-film transistors was studied in this paper. The degradation of the devices was found to be voltage and temperature dependent. In addition, the frequency and duty ratio of the gate pulse affects the degree of the device degradation. The mechanism of the device degradation was investigated, and a physical model is proposed to explain the mechanism.

Original languageEnglish
Title of host publicationAD'07 - Proceedings of Asia Display 2007
Pages1233-1237
Number of pages5
StatePublished - 2007
Externally publishedYes
EventAsia Display 2007, AD'07 - Shanghai, China
Duration: 12 03 200716 03 2007

Publication series

NameAD'07 - Proceedings of Asia Display 2007
Volume2

Conference

ConferenceAsia Display 2007, AD'07
Country/TerritoryChina
CityShanghai
Period12/03/0716/03/07

Keywords

  • Dynamic negative bias temperature instability
  • Thin-film transistor

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