Effect of Processing Temperature on Characteristics of Metal-Ferroelectric (BiFeO3)-Insulator (HfLaO)-Semiconductor Capacitors

Research output: Contribution to conference › Proceeding

Original language	American English
State	Published - 2009
Event	TACT 2009 International Thin Films Conference - Taipei, Taiwan Duration: 14 12 2009 → 16 12 2009

Conference	TACT 2009 International Thin Films Conference
Period	14/12/09 → 16/12/09

Cite this

@conference{9d9d1391f9494fd3a89b1d2a275aa606,

title = "Effect of Processing Temperature on Characteristics of Metal-Ferroelectric (BiFeO3)-Insulator (HfLaO)-Semiconductor Capacitors",

author = "Chia-Liang Sun and Juan, \{Trevor P. C.\} and Hsu, \{Y. W.\} and Liu, \{Y. W.\}",

year = "2009",

language = "American English",

note = "TACT 2009 International Thin Films Conference ; Conference date: 14-12-2009 Through 16-12-2009",

}