Effects of energetic particle bombardment on residual stress, microstrain and grain size of plasma-assisted PVD Cr thin films

J. H. Hsieh*, C. Li, W. Wu, R. F. Hochman

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

17 Scopus citations

Abstract

Residual stress, microstrain and grain size of ion plated Cr films deposited on molybdenum substrates were analyzed and studied. A model based on the effects of incident particle energy and/or momentum on the properties of these films is proposed and discussed. It was concluded that the film properties may be affected by both the momentum and energy transfer of the incident particles, or by either one.

Original languageEnglish
Pages (from-to)103-106
Number of pages4
JournalThin Solid Films
Volume424
Issue number1
DOIs
StatePublished - 22 01 2003
Externally publishedYes
Eventproceedings of the 1st Ineternational Conference on Materials - Singapore, Singapore
Duration: 01 07 200106 07 2001

Keywords

  • Cr thin films
  • Energetic particle bombardment
  • Ion plating

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